SEMATECH has announced that with the support of IEEE and the Electron Devices Society, it will host a symposium dedicated to high-k dielectric and metal gate issues for the 45nm technology generation and beyond. The 2nd International Symposium on Advanced Gate Stack Technology, kicks off Sept. 26-28 at the Omni Austin Hotel Downtown.
Additional program and registration information is available at
http://www.sematech.org/meetings/announcements/7599.htm.