Yuan Zhang Ke & Phil Ware, Canon USA, Inc., Semiconductor Equipment Division, Irving, TX, USA
Kenichi Kotoku & Yuiichi Yamada, Canon, Inc., Semiconductor Production Equipment Group, Utsunomiya, Japan

ABSTRACT 

Commercial software for cost-of-ownership (CoO) analysis, such as TWO COOLTM, is suitable for generic fab equipment evaluation. But the evaluation of optical-lithography equipment and process strategies requires a more sophisticated approach. International SEMATECH has provided highly useful information on lithography throughput modelling through its CoO programmes. This article addresses the appropriateness of the TWO COOLTM and International SEMATECH lithography CoO models in terms of the architecture and assumptions that are essential to advanced lithography modelling.