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New Product: Cost saving copper abatement for CMP tools offered by Metron |
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Sep 25, 2006 at 10:22 AM |
 Product Briefing Outline: Metron Technology has launched its ‘Aquareus' system, in what it claims is the semiconductor industry's first and only point-of-use (POU) solution for abating copper from a CMP system's effluent stream. The Aquareus system's simplified treatment process enables chipmakers to meet the stringent liquid discharge limits at a lower cost and with less risk than complex back-pad methods, according to the company.
Problem: A typical CMP tool running in production generates
effluent containing approximately one hundred kilograms of copper per
year. Aquareus concentrates copper by a factor of 200:1 for greater
efficiency and cost-effectiveness than back-pad copper abatement
methods. The Aquareus system's point-of-use design allows process
flexibility and incremental growth capability as semiconductor fab
operations expand.
Solution: The Aquareus system utilizes a highly selective,
proprietary, fluidized bed ion exchange resin technology that handles
high flows from a broad range of CMP chemical slurries, with minimal
service or maintenance. Two years of intense testing treating copper
CMP slurry in Applied Materials' Maydan Technology Center in Sunnyvale,
California, has demonstrated exceptional reliability and efficiency,
according to the company. Aquareus is claimed to cost-effectively
reduce emissions from multiple copper CMP systems to levels far below
the toughest governmental standards. Providing greater than 99% removal
efficiency and over 3000 hours MTBF, the Aquareus is claimed to save
users up to $0.15 per wafer, or up to 30% in treatment cost over
centralized back-pad systems.
Applications: Copper CMP systems effluent stream.
Platform: Jointly developed by Applied Materials, Inc. and BOC
Edwards, the Aquareus system is exclusively sold and serviced worldwide
by Metron Technology.
Availability: July 2006 onwards.
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Product Briefings 
