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Nikon and Synopsys team on DFM lithography modeling for 45nm devices |
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Sep 22, 2006 at 12:18 PM |
 With the mounting impact of low K1 imaging fidelity on advanced optical lithography tools, even with the move to immersion technology for production below the 50nm node, improved modeling of the real world impact on design features is required.
To that end, Synopsys and Nikon Corporation have announced that they
are to collaborate on the development and delivery of advanced
lithography software models and DFM enabled lithography manufacturing
solutions for 45nm and below.
"At 45 nanometers and below, the characterization and integration of
both design and manufacturing information is essential," said Anantha
Sethuraman, vice president of DFM Solutions at Synopsys. "In this new
DFM centric landscape, design companies must work together to
accelerate time to entitled yield and reduced time to market."
The "manufacturing-aware" OPC and RET lithography simulation models
will be developed from the Nikon lithography system's proprietary
signatures that will take account of optical effects such as
polarization, which is a growing problem with high NA optics.
"We believe the accuracy of OPC models can be significantly improved
and mask qualification time reduced, by incorporating our unique
lithography tool characteristics into the EDA software," stated
Toshikazu Umatate, executive officer, Precision Equipment Company,
Nikon Corporation. "By partnering with leading-edge EDA companies like
Synopsys we can provide enhanced imaging performance for our customers."
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