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New Product: Varian Semiconductor offers high current implant for 65nm on VIISta platform. |
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Sep 21, 2006 at 09:16 AM |
 Product Briefing Outline: Varian Semiconductor Equipment Associates has introduced its newest single wafer high current (SWHC) ion implanter, the ‘VIISta HCP'. This is a fifth generation SWHC product from Varian Semiconductor. According to the company, it has shipped multiple VIISta HCP systems into 65nm production and 45nm development. The systems have been accepted into high volume manufacturing and the company has received additional follow-on orders from leading logic, memory and foundry chipmakers.
Problem: Implant source chambers and beamline elements create particles
due to depositions and beam strike. The dual magnet ribbon beam
architecture of VIISta HCP isolates the wafer from sources of
particles. The second magnet filters out particles generated from
beamline elements.
Solution: The VIISta HCP improves productivity at ultra-low energies
and also reduces contamination levels. Thus further reducing
manufacturing costs The VIISta HCP incorporates new innovations to
further increase its productivity. Innovations on the patented dual
magnet ribbon beam architecture result in improved beamline
transmission, higher on-wafer beam utilization, and higher beam current
output. The unique, closed-loop Varian Positioning System (VPS) is
claimed to deliver accurate, repeatable and interlocked incident angle
control for true zero degree and precise tilted angle implants.
Applications: High current implant at 65-45nm.
Platform: The VIISta HCP is a member of the VIISta suite of single
wafer platform ion implanters with over 500 systems installed worldwide.
Availability: July 2006 onwards.
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Product Briefings 
