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Tool Order: Matsushita uses Mentor Graphics Calibre OPCverify for 65nm devices |
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Sep 19, 2006 at 01:14 PM |
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 Matsushita Electric Industrial Co has selected
Mentor Graphics' ‘Calibre' OPCverify tool for RET verification of masks used
for production at the 65nm node.
"Verification of post-OPC output is
critical to minimizing mask respins of million dollar mask sets, and avoiding
time-to-market delays," said Hiroyuki Tsujikawa, Semiconductor Company,
Matsushita Electric Industrial Co., Ltd.
"Building on the Calibre platform
for nanometer technologies has enabled Matsushita to develop a world-class
process and gain a competitive advantage in delivering a wide range of System
LSI." Calibre OPCverify addresses 'process
variability' on wafer yield by finding and fixing potentially catastrophic
yield issues on the mask before manufacturing.
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Lithography 
