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Fujitsu and Advantest form E-Beam lithography & process prototype foundry service |
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Sep 15, 2006 at 11:38 AM |
 Fujitsu Limited and Advantest Corporation are planning to form a Joint Venture prototype foundry shuttle service that will initially offer 65nm processes from Fujitsu and use Electron Beam Direct Write (EBDW) lithography developed and manufactured by Advantest in the second quarter of 2007.
The joint venture and Fujitsu plan to collaborate to develop process technologies that are suited for EBDW lithography. The companies said they were targeting practical applications for processes that would be customized specifically for using EBDW lithography on 300mm wafers at the 65nm node and progress to the 45nm node. The companies believe this is the first such operation to offer EBDW lithography and process shuttle services on a prototype foundry service using 300mm wafers.
The companies said in a statement that they were currently discussing the terms of a formal contract that would see Fujitsu hold a 55 percent stake in the JV and Advantest
hold a 45 percent stake. The JV will operate within Fujitsu's current facilities, according to the companies.
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Lithography 
