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New Product: Advance lithography lens analysis and correction software from Litel Instruments boosts |
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Aug 29, 2006 at 05:57 PM |
 Product Briefing Outline: Litel
Instruments, has released of two new products designed to increase silicon chip
performance and yield in leading edge semiconductor factories. The new
products, dubbed ‘Distortion Mapper' (DMAP) and ‘Transmission Mapper' (TMAP), are
used for analyzing and optimizing lens and illumination performance of
photolithography tools.
Problem: As feature sizes get smaller, aberration
caused malfunction is getting more important and should be considered
for correct use of lens. Accurate lens aberration measurements are
needed to predict patterning characteristics of critical layer of a
device at given lens and to decide whether the lens is usable for the
IC device. Unlike other techniques in the market, DMAP allows the
customer to independently measure lens distortion and scan sync errors
and provide customers with the necessary corrections which will
attribute to overlay improvement programs demanded by chip
manufacturers. TMAP has the ability to measure and correct unbalanced
N.A. values among multiple scanners in manufacturing, thus reducing CD
impacts, as well as measuring and monitoring lens transmission over
time.
Solution: DMAP provides lithography
engineers with the ability to analysis and correct photolithography
tool subsystems, including the precision mechanics responsible for
maintaining position control of the silicon wafer. Unlike other
techniques in the market, DMAP allows the customer to independently
measure lens distortion and scan sync errors, and provide customers
with the necessary corrections which will attribute to overlay
improvement programs demanded by chip manufacturers. TMAP will allow
customers to measure the accuracy of the Numerical Aperture of the
lens, and the ability to measure the lens to uniformly transmit light
from the light source to the silicon wafer. This information is
essential measuring error sources in 65 nm and smaller semiconductor
devices. TMAP has the ability to measure and correct unbalanced N.A.
values among multiple scanners in manufacturing, thus reducing CD
impacts, as well as measuring and monitoring lens transmission over
time.
Applications: All lithography tools (ASML,Canon, Nikon)
Platform:
All Litel products operate with standard resist coated wafers. The
wafer is exposed with the Litel interferometer on the lithography tool
to be evaluated. The interferometer is handled by the reticle handling
system in the same way as a standard reticle. Exposure time is
typically just a few minutes, and only one wafer is needed. No special
photoresist or developing processes are required for the wafer. Litel
software provides a full analysis of the lithography tool's optical
properties. Analysis time is a few minutes only
Availability: July 2006 onwards.
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Product Briefings 
