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12th Edition: Technology Considerations For Future Semiconductor Data Management Systems |
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Feb 03, 2005 at 11:01 AM |
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KENNETH W. TOBIN & THOMAS P KARNOWSKI, Oak Ridge National Laboratory1, Oak Ridge, TN, USA
FRED LAKHANI, International SEMATECH, Austin, TX, USA ABSTRACT
As
integrated circuit fabrication processes continue to increase in
complexity, it has been observed that data collection, retention, and
retrieval rates are continuing to increase at an alarming rate. At
future technology nodes, the time required to source manufacturing
problems must at least remain constant to maintain anticipated
productivity. Current commercial and manufacturer in-house data
management systems (DMS) have limited functionality in their ability to
access, analyse, and intelligently extract information from the large
variety of manufacturing data sources available within the
semiconductor manufacturing site.
It is critical that the semiconductor
industry agree on a strategic R&D plan to develop a family of DMS
technologies to simultaneously access multiple data sources and derive
useful defect and yield information from that data via analysis
algorithms. The Oak Ridge National Laboratory (ORNL) and International
SEMATECH performed an industry-wide survey of semiconductor device
manufacturers and the suppliers of data management tools and systems in
the Spring of 1999. This paper describes the results of this survey and
presents a prioritised R&D roadmap.
 Technology Considerations For Future Semiconductor Data Management Systems
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Wafer Processing 