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New Product: Axcelis’ Imax high dose, low energy boron cluster implant technology added to Optima pl |
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Aug 21, 2006 at 11:50 AM |
 Product Briefing Outline: Axcelis Technologies, has launched an Optima HD ion implanter, powered by ‘Imax,' for extremely high dose, low energy implant applications used for leading-edge memory and logic devices. The Optima HD Imax according to the company is designed to dramatically increase productivity and reduce low energy, high dose process times by implanting clusters of boron, instead of individual atoms. The first Imax-enabled Optima HD tools will begin shipping by the end of the 2006.
Problem: As semiconductor devices scale, the energy of the ion implant also scales. Very low energy implant, and very advanced annealing technologies are required to produce Ultra Shallow Junctions, or "USJs". Conventional implant systems cannot perform to expected levels at low energy due to fundamental physical limits in the extraction and transport of ion beams at low energy. Cluster ions include many dopant atoms (N) per ion. In this way, the implanter operates at a higher energy (N times the process energy) which avoids the low energy extraction and transport limits.
Solution: Axcelis has been exploring molecular source technology as a potential candidate for extending low energy implant technology since the late 1990s. The company is using ‘ClusterIon' source technology from SemEquip, a manufacturer of ion sources and ion delivery systems for the OEM implanter market. The Optima HD Imax implants molecules of B18H22 including 18 boron atoms, resulting in higher productivity than users could achieve with traditional approaches, without the risk of energy contamination associated with beam deceleration. This boost in productivity enables chipmakers to adopt a number of emerging trends, including dual poly gate applications for advanced memory devices and ultra shallow junctions in logic chips.
Applications: High dose, low energy implant used for leading-edge memory and logic devices, (Dual Poly Gate & Ultra Shallow Junction).
Platform: The Optima HD platform covers all traditional high dose implants while providing mid dose applications overlap for versatility and capital efficiency. It delivers implants using Axcelis' advanced spot beam technology, designed for uniformity and repeatability. Axcelis' proprietary ‘RadiusScan' endstation further enhances productivity and enables the system to cover a broad dose range. Imax source technology can be used on all standard Optima HD implanters.
Availability: 4Q 2006 onwards.
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Product Briefings 
