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Obducat granted non-stick nano-imprint patent |
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Aug 17, 2006 at 04:47 PM |
 Obducat AB has announced that it has received notification from the US Patent Office that it will be issued with a new patent for its nano imprint lithography processes concerning non-stick and particle repelling coating materials.
The patented anti-stick technology constitutes an important part of Obducat's solution for HVM (High Volume Manufacturing) based on NIL, according to the company. The anti-stick coating layer applied on a stamper that allows a high speed demolding process as well as a particle repellent stamp surface capabilities that improve throughput of the tool.
The company claims that the anti-stick layer also offers high durability, especially in high temperature applications, which also improves the overall stamp lifetime, while being a straight forward material to integrate into the stamping process flow.
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Lithography 
