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New Product: GES5 Evolution from Sopra covers UV to near Infra-Red spectrum |
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Aug 17, 2006 at 04:21 PM |
 Product Briefing Outline: Sopra has launched a new
version of its spectroscopic metrology tool called the GES5 Evolution
(GES5-E). The system is based on Ellipsometric porosimetry (EP), used
to characterize CVD and spin coated porous ultra low-k materials. EP
measures the change of the optical properties and thickness of the
materials during adsorption and desorption of an organic solvent. The
new system allows the complete characterization of porous thin layers
for applications related to micro-electronics as well as new organic
technologies.
Problem: Lowering the low-k film density by
introducing porosity has become an important part of R&D into
future generations of ultra low-K ILD materials. The need for
non-destructive characterisation of porous low-K dielectric films is
required. EP simpler and faster than Positronium Annihilation Lifetime
Spectroscopy (PALS) and Small Angle Neutron Scattering combined with
X-ray Reflectivity (SANS/XR), which have traditionally been used for
characterisation of porous films.
Solution:
Equipped with very significant improvements on its spectrometers and
spectrographs, the GES-E makes it possible to cover the range from UV
to near Infra-Red with unequalled specifications on the market in terms
of quality of signal, speed of measurement on the entire spectrum and
particularly at 190nm, according to the company. Analysis during
adsorption and desorbtion of an organic solvent gives the porosity of
the low-k. Pore size distribution of both microporous and mesoporous,
cumulative surface area, pore interconnectivity, Young modulus,
thickness and refractive index data is given within 2 hours. EP
qualifies the sealing layer of both patterned and blanket wafers. The
tool detects the diffusion of the solvent through the sealing layer.
The diffusion of the solvent leads to a change in refractive index of
the layer that the spectroscopic ellipsometer easily detects. EP gives
structural information and qualifies how the material can be integrated
in the dual damascene process.
Applications: EP
allows the measurement of PSD at room temperature in thin films
directly deposited on Si or any smooth solid substrate. A small surface
area (<1 mm 2) is sufficient. It is also suited to characterize
other materials like: membranes, fuel cells, Sensors, Catalysis
surfaces,Nano-structure and nano-composite materials, Hybrid organic
& inorganic interfaces.
Platform: IMEC patented the EP technology and has granted an exclusive license to SOPRA in 2004. SOPRA holds several patents on EP.
Availability: June 2006 onwards.
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Product Briefings 