Advanced Mask Technology Center (AMTC) in Dresden, Germany, a Joint Venture of AMD, Infineon and Toppan Photomasks has successfully finalized the installation of Carl Zeiss SMT's multi-generation E-beam mask repair system ‘MeRiT' MG. The company also noted that a major captive mask shop has also ordered a system, which will be shipped at the end of July 2006. Further, Carl Zeiss SMS expects AMTC to take possession of a next generation ‘AIMS' fab 45-193i mask inspection tool will cover the 45nm node on the lithography roadmap. This system is planned for shipment in autumn 2006 and continues a close technology collaboration effort between the two companies, according to Carl Zeiss.

"AMTC is another leading mask shop benefiting from our unique E-beam based mask repair technology", points out Frank P. Averdung, Managing Director of SMS division from Carl Zeiss SMT. The MeRiT tools have started to be deployed successfully in high-end mask shops throughout the industry, the next one will be shipped this month to a major captive mask shop.

The MeRiT multi-generation E-beam mask repair system was developed within the German Ministry for Education and Research (BMBF) funded project ABBILD. The system supports 65nm and future 45nm generation photomask manufacturing as well as early EUV mask evaluation programs.

"We have decided for an E-beam mask repair system from SMT because of its outstanding repair capability and accuracy for structures down to 65nm. In addition, we already have had successful experiences with the ‘AIMS' mask inspection system from Carl Zeiss SMT over the last years. Now, in combination with the MeRiT mask repair tool, we expect valuable synergy effects concerning technology, but also in the areas of service, customer focus and costs" says Matthias Peschke, Director of Engineering at AMTC.

 "With this installation AMTC clearly demonstrates its strong reliance in our mask solutions", commented Carl Zeiss SMS Board Member Dr. Oliver Kienzle. At the end of 2005 Carl Zeiss SMT already delivered an AIMS fab 193i mask inspection tool to AMTC. This mask inspection tools is able to emulate immersion scanner at the 65nm node.