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Immersion lithography ramping into production |
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Jul 26, 2006 at 09:48 PM |
According to Cymer, the main laser light source supplier for DUV lithography systems, the initial wave of immersion based 193nm ArF tools are now ramping to production levels in fabs. Cymer also reported that it had shipped 75 light sources in the 2Q period with 8 percent of units (6 units) being for immersion systems on the XLA300 platform.
Bob Akins, Cymer's chief executive officer noted that a significant number of leading-edge chip manufacturers were taking up immersion tool development work due to the success in defect reduction programs on the immersion tools chip manufacturers were becoming more comfortable with the technology as shown in the jump in light source shipments in the second quarter compared to low single digit shipments in prior quarters. Atkins also noted that immersion applied XLA300 light source shipments would almost double in the third quarter 2006. Atkins characterised 2006 as being the process development year for immersion lithography with 2007 being the year of growing production levels and substantial growth in immersion light source shipments. Overall light source usage in fabs continued to rise slightly (3 percent) quarter on quarter indicating high fab capacity utilisation rates and continuing production ramps in all regions. The company also expects to ship in the region of 550 light source units in 2006.

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