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14th Edition: Characterisation of Porous Low Dielectric Constant Films by Ellipsometric Porosimetry |
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Feb 02, 2005 at 05:50 PM |
MIKHAIL R. BAKLANOV & KONSTANTIN P. MOGILNIKOV, XPEQT, Tessenderlo, Belgium
ABSTRACT
Ellipsometric porosimetry (EP) is an effective method for
characterisation of porosity, pore size distribution (PSD) and specific
surface area in porous Low-K films. The films can be deposited on top
of any smooth substrate. EP is a new modification of the adsorption
porosimetry. In situ ellipsometry is used to determine the amount of
adsorptive which adsorbed/condensed in the film. Change in refractive
index is used to calculate of the quantity of adsorptive present in the
film.
 Characterisation of Porous Low Dielectric Constant Films by Ellipsometric Porosimetry
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Wafer Processing 
