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Tighter semiconductor contamination control |
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Jul 11, 2006 at 11:43 AM |
 Pall is introducing nine new products covering chemical, gas,
photolithography and chemical mechanical planarization (CMP)
contamination control at this week's SEMICON West show in the USA.
The UltiKleen Excellar ER filter is claimed as "the first 20nm rated,
all-fluoropolymer filter". It has a new generation PTFE membrane design
with improved surface kinetics for greater non-dewetting in aqueous and
high viscosity chemicals. While the filter features improved retention
and dewetting ability, there is no sacrifice to flow or service life.
The Ultipleat SP DR filter is a 30nm rated highly asymmetric membrane
filter developed for wet chemical surface preparation applications. The
filter's asymmetric design allows for dual retention, and its polymer
material operates at higher temperature than other polymers used in
filters. Ultipleat SP DR also features improved chemical resistance, a
hydrophilic surface and high flow rates.
For photolithography, the new 10nm rated polyethylene membrane PE-Kleen
Filter covers a broad range of lithography chemistries including 193nm
and 248nm photoresists. In point-of-use photoresist filtration,
lithographers require filters that offer exceptional defect-reducing
capabilities, while maintaining extremely low pressure during
dispensing or chemical processing. For immersion photolithography, the
company is introducing a system to supply ultra-clean water at up to 2
liters/min.
The PG Series Gaskleen purifier assemblies and manifolds for gas
purification and filtration (pictured) provide sub-parts per billion
removal of molecular contaminants from inert, flammable (silane, H(2)),
corrosive and hydride gases capable at flow rates up to 1,000slpm. The
target contaminants include moisture, oxygen, carbon dioxide, carbon
monoxide, iron carbonyls and nickel carbonyls. The Gaskleen set of
sandwich filter assemblies (1 1/8" C-Seal) allow for integration
between the substrate and another component. The sandwich filter can
reduce the overall length of a gas stick or permit the addition of
another component to an existing gas stick. The AccuSep SIL nickel
filter assembly for ultra-high purity bulk gas applications uses a
nickel filter media to provide removal of particles greater than 3nm
with 9-log efficiency.
Additionally, Pall is expanding its range of depth-style filtration for
CMP. The 0.2micron rated Profile Sirius filter is optimized for the
retention of oversized, difficult to remove, rigid ceria particles. Its
thicker, greater depth configuration provides increased performance up
to high differential pressures. The StarKleen QD Capsule offers
quick-disconnect fittings for ease of installation close to
point-of-dispense.
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