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Ultrapure water supply for immersion litho |
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Jul 07, 2006 at 11:44 AM |
 By Dr Mike Cooke
Entegris is to introduce its LiquidLens ultrapure water (UPW)
purification system aimed at the needs of immersion lithography next
week at the SEMICON West show in San Francisco. The system combines
advanced technology and process expertise from both Entegris and its
Mykrolis "merger"/acquisition in August 2005.
One of the most popular immersion lithography techniques uses ultra
pure water between the optical lens and the wafer to boost resolution.
The technique is expected to be used at the 45nm node. For the
technique to work, the water must be extremely pure as the smallest
impurity can damage image resolution, react with the photoresist, or
contaminate the lens. The LiquidLens system is designed to provide the
highest water purity level at the temperature and pressure required.
Entegris has already delivered several LiquidLens systems for
evaluation and process development use to several major customers.
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Materials & Gases 
