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Home arrow News arrow Lithography arrow Tool Order: Crolles2 Alliance extends DFM work with Brion to 45nm node
Tool Order: Crolles2 Alliance extends DFM work with Brion to 45nm node Print E-mail
Jun 06, 2006 at 10:32 AM
BrionCrolles2 Alliance that includes chip manufacturers STMicroelectronics, Philips Semiconductors and Freescale Semiconductor and foundry compatibility with TSMC has placed follow-on orders for Brion Technologies Tachyon LMC for 65nm & 45nm RET verification and Tachyon RDI design inspection for 90nm. The alliance has also entered into a new agreement with Brion to develop OPC for 45nm devices. This comes after only a year since the companies began working on DFM issues.


"Brion's Tachyon LMC model-based, full-chip verification technology fundamentally changes how we approach production of 65nm designs," said Joël Hartmann, operations director for Crolles2, based in Crolles, France. "Using Tachyon, we achieve faster and more predictable cycle times - accelerating our chip time-to-market."

Brion's Tachyon LMC, lithography manufacturability verification solution is in production on a fully automated 65nm process flow at Crolles2, according to the company.


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