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Tool Order: Toshiba selects Takumi’s photomask DFM software |
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May 31, 2006 at 03:18 PM |
 Toshiba's semiconductor division has selected Takumi Technology's automated layout mask data preparation design flow software on 65nm and below designs. A key aspect of the mask DFM technology by Takumi is its ability to identify and correct for yield inhibiting hot-spots in GDSII files.
"For a young technology company such as Takumi to receive such a firm endorsement by a company of Toshiba Corporation's stature is a sign that we are providing tangible and measurable value to our customers, said Dr. Adriaan Ligtenberg, Takumi's President and CEO. "It also indicates that our DFM methodologies in mask data preparation, defect analysis and layout modification can truly close the growing gap between design and manufacturing for sub-wavelength processes."
Toshiba's Group Manager of Lithography Process Development Group, Mr. S. Inoue claimed that the Takumi software had enabled the company to reduce the number of hot
spots from over 47,000 to just 40 in 12 hours for a 65nm SoC device.
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