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Search for better immersion photoresists goes down under! |
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May 25, 2006 at 05:16 PM |
 SEMATECH assignees are to collaborate with the University of Queensland, Australia on a new project to seek out new high-refractive-index polymers for 193nm photoresists in an effort to extend immersion lithography to the 32nm node.
"The research of high-index polymers will provide the industry with an additional avenue for the extension of optical lithography," stated Will Conley, a Freescale assignee to SEMATECH. "The partnership between SEMATECH and the University of Queensland already has yielded many interesting material platforms, and this grant from the ARC will permit the further research needed."
The Australian Research Council (ARC) has provided a grant of $510,000 Australian dollars over two years to support the research, while SEMATECH will match the amount with cash and in-kind contributions, including access to advanced immersion lithography exposure tools through SEMATECH's Immersion Technology Center, based in Albany, NY.
A two-year grant for $510,000 Australian dollars from the Australian Research Council (ARC) will be matched by SEMATECH with cash and in-kind contributions, including access to advanced immersion lithography exposure tools through SEMATECH's Immersion Technology Center, as well as project management and logistical resources.
"The support of SEMATECH on this project enables the university to assemble a world-class team dedicated to synthesis of novel resist polymers," stated Professor Andrew Whittaker, director for the Centre for Magnetic Resonance of the University of Queensland. "From our perspective, the agreement with the ARC and SEMATECH allows us to contribute to an exciting technology of great international importance."
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