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New Product: JEOL’s JBX-6300FS direct write system offers 22nm imaging flexibility |
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May 24, 2006 at 01:53 PM |
 Product Briefing Outline: JEOL, has introduced a new high precision direct write e-beam lithography system. The new JBX-6300FS is a spot beam, vector scan, step and repeat lithography system designed for high volume direct patterning on wafers, and is capable of writing minimum line widths of 8nm, according to the company. 2-inch to 200mm wafers can be accommodated, as well as parts and pieces. An autoloader allows continuous unattended operation of up to 10 cassettes under vacuum.
Problem: Continued aggressive scaling of advanced CMOS processes requires early R&D into future scaling challenges. Conventional optical lithography tools are unable to pattern features effectively below 45nm to allow advanced process development.
Solution: As a cost-effective, next-generation research and development tool, the new JBX-6300FS excels at nanoimprint lithography (NIL), a method of fabricating next-generation nanometer scale patterns onto 65mm photomask templates and finally creating the high resolution patterns directly on wafers through a 1X nanoimprint process. The ultrahigh resolution of the JBX-6300FS makes it capable of writing sub-ten nanometer linewidths onto photomasks. JEOL's JBX Gaussian Beam products allow chip manufacturers to research and develop their processes into the next several nodes. While optical lithography is still the de-facto standard, e-beam lithography of critical layers or "mix and match" lithography allow customers to pursue their next generation without the associated cost of a next generation optical lithography tool.
Applications: The new JBX-6300FS is a flexible tool for both direct write and photomask development. It is one of two systems that JEOL offers for this application. The JBX-9300FS is a high volume direct write e-beam lithography tool designed for patterning wafers up to 300mm in diameter.
Platform: The JBX-6300FS is equipped with a thermal field emission electron gun with a ZrO/W emitter, is an electron beam lithography system provided with the Vector Scan Method for beam deflection. The beam deflection employs 19bit DAC, and the accelerating voltage 25kV or 50kV or 100kV is selectable. An auto-loader is provided for continuous unattended operation of up to ten cassettes The operation system of the computer for lithography control and JOB making are done in UNIX.
Availability: May 2006 onwards.
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Product Briefings 
