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WSC members to limit use of Perfluoroctane Sulfonate in photoresists |
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May 12, 2006 at 03:18 PM |
 The World Semiconductor Council (WSC) has agreed on a new undertaking as part of the just concluded Tenth Anniversary meeting of the semiconductor trade associations of North Amercia, Japan, Taiwan, Korea and Europe to eliminate the non-critical use of process chemicals containing PFOS (Perfluoroctane Sulfonate).
A key use within a critical process step is small amounts of PFOS required for advanced photoresist during the lithography processing stage. WSC member associations have agreed to work on finding acceptable alternatives via material suppliers and SEMI collaboration on the matter.
The agreement does mean all photoresists will have to replace PFOS, rather only non-critical processes will be looked at and alternatives found.
Recent studies have indicated that PFOS is toxic and potentially harmful to humans and animals and the environment in general. In 2000, 3M and the US EPA announced that the company would voluntarily phase out PFOS manufacture.
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