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Home arrow News arrow Lithography arrow Photronics and Micron establish JV, set to build new photomask facility
Photronics and Micron establish JV, set to build new photomask facility Print E-mail
May 08, 2006 at 02:52 PM
MicronPhotronics and Micron Technology have formed a new Joint Venture (JV) business called MP Mask Technology Center, LLC to develop and manufacture Micron's range of products as well as allow Photronics to leverage its investment for use by other customers. Micron will own 50.01 percent of the new JV, while Photronics will own 49.99 percent of the new enterprise.

MP Mask will take over Micron's existing Boise based mask shop, while Photronics plans to invest $135 million US dollars into the JV over a three year period. However, Photronics will also invest between $100 and $150 million US dollars in a new mask shop, also to be built at Boise, that is expected to begin qualification of advanced masks by the end of 2007.

"MP Mask is providing Photronics with the ability to obtain and implement a competitive advantage to the industry at a time when technology partnerships represent a critical area of differentiation," stated Michael J. Luttati, Chief Executive Officer of Photronics. "Through close development collaboration with Micron, MP Mask will deliver processes that result in production-worthy photomasks that optimize wafer fab yields.

Mark Durcan, Chief Operating Officer of Micron Technology also said in a statement that, "The combined expertise of Micron and Photronics in the areas of advanced photomask technology development and fabrication will enable Micron to meet its reticle demands for increasingly high-density, low-power semiconductor devices." Durcan added, "As a leader in DRAM, CMOS image sensors and NAND flash memory, Micron is always seeking to engage the support of strategic suppliers that can provide reliable and cost-effective solutions."

Durcan will serve as chairman of the board of managers, while a management team will be made up of both companies.




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