|
15th Edition: Silicon Epitaxy: Tomorrow’s Solution Today |
|
|
|
Feb 02, 2005 at 04:21 PM |
ROBERT ROYALTY, GlobiTech Inc., Sherman, TX, USA
ABSTRACT
This article aims to provide a quick view of silicon epitaxial
deposition processes, recent advances in epitaxy, and market
projections for 300 mm and 200 mm technologies. Single-wafer systems
are replacing batch systems for performing epitaxial deposition. The
advantages of epitaxial silicon over polished wafers are outlined.
Advances in single-wafer epitaxial processes have been made that allow
cost improvements, improved layer uniformity and lower defect
densities. A forecast of future demand for Epi silicon is examined; a
substantial increase is predicted.
 12 - Silicon Epitaxy: Tomorrow's Solution Today
|
Wafer Processing 