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15th Edition: A Case Study of Furnace Modelling from a Wafer Fab’s Perspective |
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Feb 02, 2005 at 04:19 PM |
K. HUI, J.C.S. LU & K.C. SUN, Taiwan Semiconductor Manufacturing Company Ltd., Hsin-Chu, Taiwan
ABSTRACT
This article presents a case study on the applications of modelling
techniques to a diffusion furnace, and discusses some of the practical
issues encountered during the identification process in semiconductor
manufacturing. The emphasis is from the perspective of a wafer
fabrication plant, with the objective of achieving tighter targets of
statistical process control. The investigation uses actual process data
from on-line production runs. Procedures are described on the
identification process, starting from data collection, to preliminary
analysis and selection of dynamic models for the diffusion furnace, to
the revelation of underlying relationships between zone temperatures
and inputs from heaters, pressure settings and mass flow controllers.
 11 - A Case Study of Furnace Modelling from a Wafer Fab's Perspective
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Wafer Processing 
