|
15th Edition: Optical Digital Profilometry: A Breakthrough Technology for Non-Destructive Profile |
|
|
|
Feb 02, 2005 at 04:15 PM |
KELLY BARRY, MIKE LAUGHERY, NICKHIL JAKATDAR & WENGE YANG, Timbre Technologies Inc., Fremont, California, CA, USA
ABSTRACT
Optical
digital profilometry is an optical technology that provides inline
critical dimension, crosssectional profile, and film thickness
information on wafers in a single measurement non-destructively. It can
be used in most of photolithography and plasma etching process steps
for process monitoring, control, development, and fault detection. It
provides better CD measurement precision, repeatability, and can be
extended to sub-100-nm technologies and beyond.
 09 - Optical Digital Profilometry: A Breakthrough Technology for Non-Destructive Inline Profile...
|
Wafer Processing 
