|
Tool Order: Elpida places multiple etch systems order with Applied Materials |
|
|
|
Mar 28, 2006 at 02:39 PM |
 Elpida Memory has selected Applied Materials ‘Centura AdvantEdge'
silicon etch system in a multiple tool order as part of Elpida's 300mm Fab production ramp for both production of 90nm and 70nm DRAM devices.
"The key factor in our selection of the AdvantEdge Etch system for our most advanced DRAM production was its unique tuning capability, which delivers superior process performance for a wide range of advanced memory applications," stated Jiro Yamamoto, plant manager of Hiroshima Elpida Memory. "Based on our positive experience with Applied's earlier silicon etch technology, we expect the AdvantEdge Etch system to achieve high productivity and reliability as we move to volume production. Applied's consistently excellent support, and the capability to also extend our large installed base of Applied Centura DPS(R) etch systems with the AdvantEdge chamber technology, are
additional significant advantages."
Applied has shipped over 90 ‘Centura AdvantEdge' systems since launch last year.
|
News 
