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Real-time patterning control for 65-nm and below |
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Feb 21, 2006 at 03:09 PM |
 KLA-Tencor formally unveiled its K-T Analyzer lithography "correctables" platform at the SPIE lithography meeting in San Jose, California. The system, aimed at 65nm and below process development, encompasses overlay and critical dimension corrections, "seamlessly" integrating KLA-Tencor's Archer overlay, eCD CD SEM, and SpectraCD optical CD metrology platforms.
K-T Analyzer provides automated, on-tool analysis of overlay and critical dimension (CD) metrology data in real time -- giving engineers feedback on the quality of their lithography process. This enables them to correct errors quickly, reduce unnecessary wafer rework, and make efficient use of lithography equipment, thereby ensuring that optimal productivity and tight process control are maintained. KLA-Tencor reports that K-T Analyzer is now being used to enhance focus/dose analysis applications at several leading logic and memory manufacturers worldwide.
Shaunee Cheng, principal scientist at IMEC, comments: "Almost every metrology tool vendor provides raw data, but what we really need is to automatically access the actionable information required to make accurate decisions."
The new eCD Analyzer collects data -- including CD linewidth, feature shape and profile information -- directly from the eCD platform in real time. The data can be used to supply information on best exposure and focus, exposure latitude and depth of focus to provide an immediate snapshot of the size and position of the process window across multiple pitch and CD structures, multiple points across the reticle field, and multiple lithography cells. Temporal variations can also be detected. This information can be fed into a fab's existing advanced process control (APC) or automated equipment control (AEC) framework to enable improved feed-forward and feed-back process corrections, lot or tool disposition, root cause analysis and automated fault detection. This knowledge is also sent to an off-line server for engineering troubleshooting analysis.
The Archer Analyzer software was previously introduced by KLA-Tencor as an option on the Archer overlay metrology platform, providing overlay disposition, focus/dose product excursion and focus/dose litho cell monitoring and engineering analysis functions. eCD Analyzer and Archer Analyzer are both available now as part of the K-T Analyzer platform. SpectraCD Analyzer will be available in the second quarter of 2006.
By Dr Mike Cooke
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