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SPIE Microlithography Conference |
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Feb 20, 2006 at 04:29 PM |
There is one good thing about having jetlag when you travel from Europe to California—the mornings are no problem as your body thinks its 5pm in the afternoon! With well over 4,000 lithography engineers from all over the world expected to attend the week long conference and two day exhibition, getting registered early saves on the cueing and a better chance to sit down and scan the sessions program, which still seems easier to navigate than the PDF version found online at SPIE.org.
However, the best part is being able to look at the technical abstract summary book as this is the first time we have a chance to really weed out the "must attend" sessions and speakers.
Like many such technical conferences it is almost-well actually it is more like- impossible-to sit in on all the hot topics but each year you give it ago. SPIE really packs in the content from 8am in the morning through 10pm most evenings-day in day out.
Although the conference sessions do not start until Monday morning, Sunday is actually a full day for many people attending the event. Short courses are the big thing but Nikon also holds its annual "LithoVision" mini conference on the Sunday, which is a very popular event. So popular that it has been "sold-out" for sometime!
Then in the early evening KLA-Tencor takes over the mini-conference slot by holding its annual "Lithography Users Forum." This is also a very well turned out event and the content is typical of the company approach, which is detailed and highly informative.
After a full Sunday, it's back to the hotel to write up some key aspects of that days events. The only problem here is that my body clock will be telling me it's around 5am in the morning!
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