Laura Mendicino, Victor Vartanian, Brian Goolsby & Paul Thomas Brown,
Motorola, DigitalDNA™ Laboratories, Austin, TX, USA

ABSTRACT

Many chemical vapour deposition (CVD) processes utilise new precursors and it is important to carry out environment, health and safety assessment of these during their use in R&D. Emissions characterisation is key to this process and a dry, hot scrubber system is described that can be utilised for point-of-use abatement in these advanced CVD processes.