Julian A. Montoya, Intel Corporation, Hillsboro, Oregon, USA & Vincent Esqueda, Intel Corporation, Phoenix, Arizona, USA

ABSTRACT

As semiconductor devices shrink in size to accommodate Moore's Law, the need for high-resolution beam-based metrology and beam-based writing equipment increases, and the dependence of such equipment for process development and process validation becomes more critical. For the purposes of this discussion, beambased metrology and writing equipment will be defined as equipment that utilizes an electron beam to perform its intended function.