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New Product: Air Liquide launches R&D to production advanced precursors |
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Sep 26, 2005 at 12:00 AM |
 Product Briefing Outline: Air Liquide, has created "ALOHA" a dedicated
product line and world-wide organization devoted to the development,
manufacture and support of advanced precursor materials and delivery
systems. ALOHA made its industry-wide debut at the 2005 Semicon West
trade show.
Problem: The growing demand of shrinking geometries for next-generation
semiconductor devices is driving the need for continuous development of
new materials.
Solution: Air Liquide has developed in-house deposition (ALD, CVD,
PE-CVD) and film characterization capabilities in order to quickly
screen numerous candidates for our R&D partners. These
developments, that include some proprietary molecules such as ToRuS for
C-free Ru ALD, AHEAD™ for low-T SiN or TDEAA for ALD of Al2O3 and
high-k nanolaminate, are introduced to the market through partnerships
with key customers and OEM's.
Applications: ALD, CVD, PE-CVD
Platform: Air Liquide Electronics provides ultra pure gases, liquids
and advanced molecules used in the fabrication of silicon chips as well
as providing specialized equipment and related gas and chemical
management services. Through it subsidiary, Balazs, Air Liquide
Electronics also provides state-of-the art analytical and laboratory
services.
Availability: July 2005 onwards
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Product Briefings 
