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New Product: Polarized light used in mask inspection tool from n&k |
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Dec 22, 2005 at 03:36 PM |
 Product Briefing Outline: n&k Technology, has launched its
next-generation photomask system that combines the capabilities of a CD-SEM, a
DUV dual-beam laser-interferometer, and a spectroscopic ellipsometer into a
single unit.
Problem: The
n&k 5700-CDRT, simultaneously furnishes polarized reflectance (R) and
transmittance (T) spectra in the DUV-Vis-NIR wavelength range, while the
previous generation, the n&k 3700-RT, utilized unpolarized light.
Solution: The new system measures both blank and
patterned photomasks. It also provides film
thickness, values of n and k, and phase-shift of MoSiON, even with the presence
of a chrome layer. Measurements are fast and non-destructive, with exceptional
repeatability and reproducibility, which correlate closely with AFM, SEM and
Interferometer measurement., according to the company. The system Measures
Reflectance and Transmission, both from 190 nm to 1000 nm, Simultaneously, in 1
nm Intervals
Applications: Blank and patterned photomasks.
It takes measurements of phase shift on the mask without a special test
structure. Platform:
Combines the capabilities of a CD-SEM, a DUV dual-beam laser
interferometer, and a spectroscopic ellipsometer into a single unit.
Sample holder with edge grip end effector for reticle handling. SMIF
load port configured for reticles. BOLT interface for quick change of
Load Port Modules.1 or 2 load ports can be placed on the system.
Availability: December
2005 onwards
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Wafer Processing 
