 Product Briefing Outline: Jordan Valley Semiconductors has launched the "JVX 6200" metrology tool platform. The new platform combines second generation X-ray Reflectivity (XRR), improved micro-spot X-ray Fluorescence (XRF), and industry leading Small Angle X-ray Scattering (SAXS), according to the company.
<!--[if !supportEmptyParas]--> Problem: The Small Angle X-ray Scattering channel has the capability to measure the pore size and distribution in porous low-k films. The data has shown excellent correlation to PALS and minimum pore size detection down to sub-10 Angstrom diameter pores, according to the company. Solution: The platform JVX 6200 features a smaller maintenance footprint, reduced preventative maintenance, higher throughput on XRR brightness and XRF flux, and new algorithm sophistication with a dual-processor CPU, which enables real-time processing. Combined, these features are designed to reduce total cost of ownership in volume production applications. Applications: Porous low-k films <!--[if !supportEmptyParas]--> Platform: The 6200 platform's technological innovations also include smaller spot size XRR and XRF, enhanced performance on high scatter samples and ultra-thin films (<30 Angstroms), extended thickness range XRR measurements, and "smart" algorithms that allow broader search ranges for improved ease-of-use. Additional system benefits are increased stage stepping resolution and stage performance on bowed wafers, improved pattern recognition with edge models and increased low-contrast feature performance, a color camera and microscope with enhanced magnification, and a new Windows(R)XP operating system. <!--[if !supportEmptyParas]--> Availability: December 2005
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Product Briefings 
