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Photronics plans advanced photomask facility in Korea |
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Jan 10, 2006 at 02:45 PM |
Photronics has said it is in the final stages of the site selection
process for a new photomask fabrication facility in Korea that will
produce masks for the 65nm, 45nm and 32nm nodes in the second half of
2007.
Groundbreaking is expected in the second half of 2006, taking
approximately 12 months with a cost of between $150 million and $300
million US dollars, depending on the level of tools redeployed from
other facilities, according to the company.
"Technology advancements, though not likely to experience deceleration,
will be concentrated into the hands of the semiconductor industry's
largest companies," stated Michael J. Luttati, Chief Executive Officer
of Phtronics. "The performance and economic drivers that have emerged
at the 65nm, 45nm, and 32nm process nodes are creating excellent
customer alignment opportunities for the image resolution technology
and services that Photronics provides to leading semiconductor
manufacturers and foundries. Over the next several years, these process
nodes will represent the fastest growing segments within the global
photomask industry and for Photronics, said Luttati.
Photronics currently maintains an Asia-based Corporate Research &
Development Center in Cheon-an, Choong-nam, Korea. The company cited
the growth in business in the country as well as the availability of
the skilled workforce in the region as deciding factors in locating the
facility in Korea.
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