Home
News
Blogs
Fabtech Jobs
Product Briefings
Going Places
300mm Activity Reports
Core Sections
Wafer Processing
Lithography
Fab management
Materials & Gases
Critical Components
Cleanroom
EHS
 
Find

GlobalSpec - The Engineering Search Engine
 
Home arrow Product Briefings arrow Lithography arrow New Product: Mentor Graphics updates OPC & RET software to include immersion ...
New Product: Mentor Graphics updates OPC & RET software to include immersion lithography Print E-mail
Jan 09, 2006 at 05:33 PM

Product Briefing Outline: Mentor Graphics Corporation has launched the "Calibre OPCverify" tool, a new generation of OPC technology and has expanded the design for manufacturing (DFM) solutions from Mentor. Calibre OPCverify uses silicon-proven simulation models from Calibre OPCpro, providing 100% simulation coverage of the entire chip to ensure silicon-patterning success, according to the company.

Problem: The increased complexity of resolution enhancement technology (RET) at 65 nanometers is impacting lithographic yield in several ways. The major contributors to declining yields are: a smaller lithographic process window, increased sensitivity to layout topology in the lithographic process, and complex mask rule constraints that impact the application of RET. These issues must be addressed with a fast, accurate and easy-to-use RET verification solution that detects yield-limiting conditions.

Solution: Calibre OPCverify, uses silicon-proven simulation models from Calibre OPCpro for RET verification, with a claimed 100% simulation coverage of the entire chip. The pixel-based simulation engine accounts for the effects of process variability using patented algorithms that define the conditions (dose, focus) that adversely impact pattern transfer. All Calibre OPCverify modeling capabilities have been characterized for the most advanced process conditions in production, including immersion lithography, according to the company. The rigorous model development and verification methodology used for the Calibre OPCverify tool allows both RET recipe validation and mask verification. The set-up and configuration of Calibre OPCverify is enabled through a user interface called the Calibre Verification Center. With Calibre OPCverify and the Calibre Verification Center, a comprehensive and accurate RET mask verification flow can be integrated seamlessly into existing post-layout flows that is claimed to take, less than 24 hours.

Applications: OPC on RET masks.

Platform: Calibre OPCverify and the Calibre Verification Center take advantage of existing workstation hardware. Because of the design-independent nature of the tool, users experience very predictable runtimes and scalability, the company claims. Actual run time is dependent on the hardware used, the Calibre OPCverify terapixel simulator is scalable to hundreds of CPU's, and can handle flat or hierarchical data.

Availability: Calibre OPCverify and the Calibre Verification Center are available immediately. Pricing starts at $80K US dollars


Readers' comments



Bookmark with:
DeliciousDiggredditStumbleUpon

Visit Fabtech Jobs websiteSubscribe to Fabtech weekly newsletter

Related articles
New Product: Mentor Graphics updates OPC & RET software to include immersion lithography  (09/01/2006)
New Product: New RET technique turns lithography inside out  (03/10/2005)
New Product: New RET technique turns lithography inside out  (03/10/2005)
Tool Orders: Elpida selects PDF Solutions IC yield management solutions fab-wide  (27/09/2005)
Celerity sues Ultra Clean over fluid distribution technology  (19/09/2005)

Related jobs
Physical Design (Layout) Engineer  (Williston, 15/10/2007)
Precision Mechanics Design Engineer  (Wilton, 30/09/2007)
Product Marketing Manager  (Silicon Valley , 14/09/2007)
Sr. Opto-Mechanical Engineer   (Milpitas, 14/09/2007)
Customer support Engineer  (Newyork, 14/09/2007)
Subscribe
300mm