Online information source for semiconductor professionals

ASML strengthens position as top lithography supplier

18 March 2008 | By Mark Osborne | News > Lithography

Popular articles

Micron moving fast on Hynix in Q208 NAND flash rankings, says iSuppli - 19 August 2008

Numonyx to close California Technology Center - 12 August 2008

Qimonda starts major reorganization: exits PC DRAM market - 13 October 2008

Applied Materials sees higher CapEx spending for 2009 - 15 August 2008

Micron close to Inotera share purchase, says Gartner - 06 October 2008

According to the latest 2007 semiconductor equipment supplier rankings from VLSI Research, ASML has been strengthening its position as the number one lithography supplier, by revenue, in recent years.

Both Nikon and ASML have seen revenues increase year-on-year. However, in 2004, ASML had revenues of $3.074 billion - just over double the revenues of Nikon ($1.411 billion), then ranked third largest lithography supplier. The gap between the top two lithography equipment suppliers is now approximately 2.4X.

Some of the gains realised by both equipment companies have been at the expense of Canon. The linear trend line shows a marked decline for Canon’s lithography revenues from 2004 through 2007. However, Canon’s actual revenues reached a low point in 2005 and have been gradually improving since, reaching $1.309 billion in 2007, compared to $1.088 billion in 2005.

A key reason for ASML’s strengthening revenues has been its leadership in 193ArF tool sales - both wet- and dry-based platforms - in recent years. This has also been compounded by exchange rates between the Yen and the U.S. dollar.

Related jobs

Factory Start Up Director/Manager (Solar Factory Operations) - Applied Materials - , 07 August 2008

Quality Assurance Engineer - Tokyo Electron Limited - Santa Clara , 30 October 2007

Technical Support Engineer - Carl Zeiss SMT, Inc. - Peabody, 10 August 2007

Electrical engineering - Axcelis - Beverly, 10 August 2007

Senior Applications Engineer - Axcelis - Beverly, 09 August 2007

Related articles

ASML’s Supervisory Board announces resignation of Rolf Deusinger - 06 June 2008

ASML touts 11nm capability for EUV lithography - 30 September 2008

Double take on Applied Materials targeting litho supplier ASML - 09 July 2008

ASML announces Board of Management changes for 2009 - 30 October 2008

Wet and dry 193nm ArF lithography key choice for 32nm node production - 22 May 2008

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: