 Product Briefing
Outline: Jordan Valley Semiconductors has launched the "JVX 6200" metrology
tool platform. The new platform combines second generation X-ray Reflectivity
(XRR), improved micro-spot X-ray Fluorescence (XRF), and industry leading Small
Angle X-ray Scattering (SAXS), according to the company.
Problem: The
Small Angle X-ray Scattering channel has the capability to measure the pore
size and distribution in porous low-k films. The data has shown excellent
correlation to PALS and minimum pore size detection down to sub-10 Angstrom
diameter pores, according to the company.
Solution: The
platform JVX 6200 features a smaller maintenance footprint, reduced
preventative maintenance, higher throughput on XRR brightness and XRF flux, and
new algorithm sophistication with a dual-processor CPU, which enables real-time
processing. Combined, these features are designed to reduce total cost of
ownership in volume production applications.
Applications: Porous
low-k films
Platform: The
6200 platform's technological innovations also include smaller spot size XRR
and XRF, enhanced performance on high scatter samples and ultra-thin films
(<30 Angstroms), extended thickness range XRR measurements, and
"smart" algorithms that allow broader search ranges for improved
ease-of-use. Additional system benefits are increased stage stepping resolution
and stage performance on bowed wafers, improved pattern recognition with edge
models and increased low-contrast feature performance, a color camera and
microscope with enhanced magnification, and a new Windows(R)XP operating
system.
Availability: December
2005
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Product Briefings 
