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TEL and IMEC continue advanced lithography development program |
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Dec 13, 2005 at 01:01 AM |
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Tokyo
Electron has extended research into advanced lithography technologies with IMEC
as part of IMEC's Industrial Affiliation Program on EUV lithography. TEL will
provide a new photoresist coater/developer tool in January 2006 with the
program expected to run for three years.
As an
extension of the current collaboration on immersion lithography, TEL will also
install a state of the art CLEAN TRACK(TM) LITHIUS(TM) i+ system for Hyper NA
193nm Immersion Lithography in Q1/2006. This tool will feature technologies
specific to immersion lithography developed as a result of defectivity work
carried out by IMEC and TEL using the CLEAN TRACK ACT(TM)12 currently installed
at IMEC. The LITHIUS I+ will be interfaced to IMEC's ASML XT1700i to form a
world leading immersion lithography cluster.
TEL now has
nine CLEAN TRACK systems installed at IMEC's facilities in Leuven.
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