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New Product: Gigaphoton delivers 60 watt, 6,000 Hz immersion light source |
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Dec 09, 2005 at 02:15 PM |
Product Briefing Outline: Gigaphoton Inc has launched the GT60A a 193 nm, 6,000 Hz repetition rate, 60 watt laser light source designed for immersion lithography tools patterning at the 45nm node.
Problem: A high level of throughput and stable spectrum performance are essential for an ArF laser to be used as a light source for immersion ArF lithography.
Solution: Improving on the GT40A, which achieved a repetition rate of 4,000 Hz, the GT60A reaches a repetition rate of 6,000 Hz on the same platform through greatly enhanced efficiency. This improvement enables an output level that is more than 33% higher than the GT40A, while limiting the energy per pulse. While the GT60A features output and repetition frequency enhancements, the laser's spectral performance supports the resolution of lithography tools at the same level as the GT40A.
Applications: Immersion lithography, 45nm node. Platform: The GT60A use the same platform as that of the GT40A—maximizing standardization as well as enabling the use of common components for ensuring high reliability. In addition to its self-diagnostic function, the GT60A features a variety of functions to enhance system availability. Laser Chamber (Oscillator) 13 billion pulses.
Laser Chamber (Amplifier)19 billion pulses. Monitor Module 30 billion pulses. PO Front Mirror 12 billion pulses. PO Rear Mirror 12 billion pulses. F2 Trap Module 200 cycles.
Availability: December 2005
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Product Briefings 
