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First EUV masks shipped from AMTC |
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Dec 02, 2005 at 04:46 PM |
The Advanced Mask Technology Center (AMTC) based in Dresden,
Germany has shipped the first EUV masks for ASML's EUV alpha tool, highlighting
the latest milestone in developing the infrastructure for the possible adoption
of the lithography technology for designs at 32nm half-pitch dimensions in the
2010-2012 timeframe.
"The advanced EUV masks from Toppan Photomasks are an important component of
qualifying the ASML EUV alpha tool," said Noreen Harned, vice president technology,
marketing and new business, ASML. "ASML is committed to collaborating with
industry leaders, including Toppan Photomasks, to explore technologies that may
take lithography beyond the immersion era."
Dr. Franklin Kalk, chief technology
officer, Toppan Photomasks stated that, "The delivery of these masks
underscores our determination to support our customers' quest for NGL
technologies for 32nm and beyond."
Toppan Photomasks' Dresden manufacturing campus includes a commercial
production facility and a joint venture R&D center called the Advanced Mask
Technology Center (AMTC). The AMTC is equally owned by Toppan Photomasks,
Advanced Micro Devices Inc. and Infineon Technologies AG.
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