Problem: Based on the company's Model 600 HF CVD System, the Model 250 allows researchers to take advantage of the wide deposition area and uniform process of sp3's reactor technology at a fraction of the cost of the Model 600 production system, the company claims.

Solution: The Model 250 can be used to apply highly uniform diamond film over a span of 200 mm within the 250 mm by 250 mm deposition area and allows users to maximize the benefits of the product's hot filament chamber and filament array design in conjunction with their own process control schemes. Depositions can include films with grain size ranging from microcrystalline diamond to nanocrystalline diamond. The use of diamond is rapidly expanding into a wide array of electronic applications based on diamond-on-substrate deposition.

Applications: Expected R&D uses for the Model 250 include process development for MEMS, SAW devices, heat spreaders, wear coatings, electrodes and cutting tools.

Platform: The Model 250 comes with a 15kW DC power supply, safety interlocks, a water-cooled process chamber, a two-dimensional filament array with a patented tension control mechanism, and a planar deposition fixture. It is designed to integrate easily with laboratory supplied gas, vacuum, and control subsystems for user developed process recipes.

Availability: November 2005 onwards.