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Home arrow Product Briefings arrow Lithography
Lithography
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 Date Item Title Hits
Sep 22, 2006 at 05:26 PM New Product: Brion’s new Tachyon M3D accounts for 3D imaging effects on photomasks 2369
Sep 20, 2006 at 10:54 AM New Product: Nikon’s NSR-S610C immersion tool uses 1.30 NA catadioptric lens for sub-45nm patterning 2512
Sep 18, 2006 at 04:52 PM New Product: Invarium offers ‘wet’ versus ‘dry’ lithography patterning synthesis trade-offs: 45-32nm 2365
Aug 29, 2006 at 05:39 PM New Product: Advance lithography lens analysis and correction software from Litel Instruments boosts 2090
Aug 29, 2006 at 04:19 PM New Product: Electrical DFM issues handled by Blaze DFM’s optimization software 2114
Aug 23, 2006 at 06:11 PM New Product: New DFM suite from Synopsys aims to shorten correction, correlation & completion tasks. 1921
Aug 17, 2006 at 03:59 PM New Product: LiquidLens UPW purification system from Entegris designed for immersion lithography 2034
May 24, 2006 at 01:53 PM New Product: JEOL’s JBX-6300FS direct write system offers 22nm imaging flexibility 2850
May 22, 2006 at 03:00 PM New Product: Picarro offers ammonia detection below 1 part-per billion 2418
May 22, 2006 at 02:44 PM New Product: Mask data verification tool detects potential yield issues in mask manufacturing 2394
Feb 20, 2006 at 06:27 PM New Product at SPIE 06: Aprio offers design-aware manufacturing OPC tool to designers 2272
Feb 17, 2006 at 03:57 PM New Product: Defect inspection tool from KLA-Tencor captures progressive defects on photomasks 2600
Feb 09, 2006 at 11:19 AM New Product: Invarium reveals “Process and Proximity Compensation” software for 65nm layout-to-mask 2477
Feb 08, 2006 at 06:28 PM New Product: KLA-Tencor boost productivity on optical CD metrology system 2591
Jan 09, 2006 at 05:33 PM New Product: Mentor Graphics updates OPC & RET software to include immersion lithography 2444
Dec 09, 2005 at 02:15 PM New Product: Gigaphoton delivers 60 watt, 6,000 Hz immersion light source 2560
Oct 05, 2005 at 10:54 AM KLA-Tencor targets post-RET inspection & analysis 2314
Oct 04, 2005 at 05:48 PM Photomask metrology for 65nm features 2630
Oct 04, 2005 at 04:19 PM New Product: Full-chip lithography simulation 3583
Oct 03, 2005 at 05:55 PM New Product: New RET technique turns lithography inside out 2494
Sep 27, 2005 at 09:45 PM Faster CD control for 3D libraries 2164
Sep 27, 2005 at 09:41 PM Versatile highly efficient AMC filter 2522
Sep 27, 2005 at 09:37 PM Combined ellipsometry and scatterometry in a single tool 3024
Sep 27, 2005 at 09:33 PM All refractive hyper NA optics for production immersion lithography 2762
Sep 27, 2005 at 09:25 PM Catadioptric inline multi mirror lens system for immersion lithography 2473
Feb 17, 2005 at 12:00 AM Laser mask writer takes on 65nm critical layers 3701
Feb 04, 2005 at 11:00 PM Total repair solution for advanced photomasks 3370
Feb 04, 2005 at 10:00 PM High productivity on high aspect ratio contract holes 3022
Feb 04, 2005 at 09:00 PM Shrink assist resist 2870
Feb 04, 2005 at 08:00 PM Cost-effective sub-50 nanometer lithography using step and flash nano-imprinting 2334
Feb 04, 2005 at 07:00 PM Filter life estimates gain online web assistance 2748
Feb 04, 2005 at 06:00 PM Polarized illumination system give 20% resolution gain 2258
Feb 04, 2005 at 05:00 PM KrF scanner with 25% higher productivity 2668
Feb 04, 2005 at 04:00 PM Molecular contamination monitoring in 193nm ArF tools 2913
 
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