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Fab Management Product Briefs   RSS Feed
Product Briefing Outline: Hach Ultra has introduced the MET ONE 6000 Series Remote Airborne Particle Counters, which offer accurate and reliable continuous particle monitoring. With a sensitivity range of 0.2  Read More
Product Briefing Outline: Numetrics Management Systems has launched ‘NMX-ERP’ 3.0, its next-generation suite of enterprise resource planning (ERP) software for integrated circuit (IC) development organizations. The new software significantly extends  Read More
Product Briefing Outline: Aquest Systems has introduced its new ‘FabEX’ No-Wait-Productivity (SM) Improvement (NPI) solution that is designed optimize material movement in an existing fab by eliminating bottlenecks and congestions  Read More
Fab management

The Fab Management section is primarily concerned with leading edge IC facilities' operational endeavours in ramp and full production environments.  It covers a broad range of topics and issues that impact productivity, throughput and cycle times. Also included are articles covering market, business and technology trends that relate directly or indirectly with fab operations at the macro level.



24th Edition: Management cost per function reduction in manufacturing Print E-mail
Dec 11, 2004 at 02:55 PM

John E.J. Schmitz, Chief Operating Officer, Manufacturing Technology, International SEMATECH Manufacturing Initiative, Austin, Texas, USA

ABSTRACT

This article discusses the escalating costs associated with manufacturing advanced electronic circuits. Emanufacturing will have to play a much larger role in this manufacturing if the requirements are to be met on schedule. It is concluded that all players in semiconductor manufacturing will have to adopt this approach if they are to remain competitive. 

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24th Edition: Worldwide capital-spending trends Print E-mail
Dec 11, 2004 at 12:00 AM

Bill McClean, President IC Insights, Inc, Scottsdale, AZ, USA

ABSTRACT

Figure 1 provides worldwide capital spending trends from 1995 through 2003 and a forecast for 2004 through 2008. As shown, semiconductor industry capital spending is not expected to exceed 2000's level until the peak of the next IC industry cycle in 2008! When looking at the per cent change line in Figure 1, it is evident that IC insights believes that the historically volatile trends in capital spending outlays will continue through 2008. 

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23rd Edition: Easing the transition to 300-mm wafer fabrication Print E-mail
Sep 21, 2004 at 02:53 PM

Thomas J. Sonderman, Advanced Micro Devices, Austin, TX, USA

ABSTRACT

The demands on semiconductor manufacturers have never been greater than they are today. Companies are challenged to meet market demand by delivering increasingly sophisticated products in high volume, on time and more cost-effectively than ever before. The economy of scale makes a conversion to 300-mm wafers ultimately beneficial, but there is an inherent risk associated with the transition. With the value of each 300-mm wafer more than double that of 200-mm wafers, 300-mm manufacturing demands a level of process improvement that effectively keeps costs low while maximizing the value of each wafer.

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22nd Edition: Best practices for wafer-fab cycle-time management – tool uptime Print E-mail
Jul 19, 2004 at 12:00 AM

Jennifer K. Robinson, FabTime, Inc.

ABSTRACT

FabTime is focused on improving wafer-fab cycle times through consulting, training, and our webbased digital dashboard software. For the past two years, we have conducted an informal survey of the roadblocks to great fab cycle-time performance. To date, the top response has been "equipment downtime". In this article, we discuss several best practices for improving fab cycle time by focusing on tool uptime. 

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22nd Edition: Real-time profile control: advanced process control for copper CMP Print E-mail
Jul 18, 2004 at 02:47 PM
Doyle Bennett, Jimin Zhang, Bogdan Swedek, Jeff David & Manush Birang, Applied Materials and Dick de Roover, SC Solutions

ABSTRACT

Real-time profile control (RTPC™) has been implemented for 300-mm copper CMP via closed-loop control of bulk copper removal, on a withinwafer (WIW) basis. The method uses a high-resolution sensor to measure the copper thickness across the wafer during polishing (in situ). The bulk copper-removal process is controlled via incremental changes to polishing conditions in situ, real-time using a multi-zone polishing head, the Titan Profiler™.Write Comment (0 comments)
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21st Edition: Robustness evaluation and improvement method for automated material handling systems Print E-mail
Feb 17, 2004 at 02:23 PM

R. Sturm & K. Reddig, Fraunhofer Institute Manufacturing Engineering and Automation Stuttgart, Germany. D. Glüer, Advanced Micro Devices Saxony LLC & Co. KG, Dresden, Germany

ABSTRACT

Planning and operating automated material handling systems (AMHS) for microelectronics and semiconductor manufacturing have become increasingly important for modern high-volume production lines. As a service system for the manufacturing process, reliable material supply to the process equipment is mandatory, and the scope of operating an AMHS is on the prompt. 

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21st Edition: Advanced process control and intelligent metrology Print E-mail
Feb 16, 2004 at 02:20 PM

James Moyne, Brooks Automation, Inc.

ABSTRACT

Advanced process control (APC) capabilities such as "run-to-run control" are now required components of lithography system solutions. Unfortunately these control solutions, usually targeting overlay and CD control, have generally been developed from the ground up with non-standard APC automation strategies. 

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20th Edition: Ramping up to DFM: design for manufacture Print E-mail
Oct 18, 2003 at 04:12 PM

John Ferguson, Mentor Graphics, OR, USA

ABSTRACT

As designs grow more complex, process technologies become smaller and geometry counts increase, the work required to achieve acceptable yield becomes increasingly demanding and difficult. Underlying this issue is the need to maximize yield without
increasing manufacturing costs. Because of uncertainty of yield, companies are reluctant to manufacture at smaller process
technologies, such as 90 nm. Most are still manufacturing at 180 nm, where yield and cost is relatively predictable and controllable. As
companies ramp up to 130 nm and smaller, the need for managing yield issues is greater than ever. It is essential to have enough yield issue information to make a business decision about what is a cost-effective solution.

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20th Edition: Equipment Lifecycle Management Print E-mail
Oct 18, 2003 at 04:08 PM

Trey Brown, GE Global Electronics Solutions

ABSTRACT 

The semiconductor industry is one of the most capital-intensive industries in the world and in today’s economic environment manufacturers are in a cautious mode looking for ways to mitigate some of their costs while making prudent decisions for the future. Consequently, leading manufacturers are now evaluating their long-term equipment strategy and entertaining an array of options that include leasing capital equipment, purchasing used equipment and remarketing equipment they no longer need. This article will discuss the three stages of Equipment Lifecycle Management for the semiconductor industry – acquiring equipment by lease or purchase, optimizing it, and finally remarketing the equipment when it is no longer needed. A comprehensive Equipment Lifecycle Management approach recognizes the reality that there will never be a ‘final’ optimal end result from even the most
thorough capital equipment evaluation and selection procedure. In reality, it is a continuous dynamic tension between rapidly changing technologies, shorter product cycles, longer lasting equipment values and the need to carefully manage financial resources. Only a unified Equipment Lifecycle Management process that encompasses all key activities, ranging from acquisition to optimization through disposition, will enable companies to stay on top of their constantly changing capital equipment needs.

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19th Edition: Key challenges in ramping 300mm fabs Print E-mail
Jul 21, 2003 at 09:49 AM

Mark Osborne, Editor-in-chief, Semiconductor Fabtech

With our work on tracking 300mm activity, primarily from the construction to first silicon perspective, we discovered a trend that has yet to receive any real attention from the semiconductor industry media and analysts. The majority of 300mm fabs have not been able to ramp wafer production anywhere comparable to that experienced with 200mm fabs. We investigate the key reasons for the slow ramp rates and provide an insight into the challenges facing 300mm fabs in ramping successfully. 

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