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Feb 04, 2005 at 09:00 PM |
 Product Briefing Outline: Novellus Systems, has
launched "ALTUS DirectFill" - a single-system solution designed to meet
contact and via-fill needs at 65 nm and below. DirectFill eliminates
the need for conventional titanium/titanium nitride (Ti/TiN) toolsets.
This advanced plug-fill technique can reduce contact resistance (Rc)
and lower overall cost of ownership (CoO) by 50 percent or more when
compared to existing processes, the company claims.
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Feb 04, 2005 at 08:00 PM |
 Product Briefing Outline: Molecular
Imprints' new " Imprio 250" nano-imprint system uses Step and Flash
Imprint Lithography "S-FIL" technology. The Imprio 250 offers sub-50 nm
half-pitch resolution, sub-10 nm alignment, as well as integrated
magnification control, and delivers high resolution and precision
alignment for customers seeking cost-effective lithography.
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Feb 04, 2005 at 08:00 PM |
 Product Briefing Outline: Rohm and Haas Electronic
Materials CMP Technologies, a leader in polishing technology for the
global semiconductor industry, today introduced another new barrier
slurry optimized for low-stress/low-pressure chemical mechanical
planarization (CMP) of copper semiconductor devices. SSA Barrier
Slurry, targeted at 90nm and 65nm CMP, provides consistent performance,
excellent defectivity and a large processing window, leading to
improved yields and cost of ownership for low-k applications.
Customer-proven in both capped and uncapped integration schemes, SSA
Barrier Slurry minimizes microscratches, improves sheet resistance, and
lowers overall defect counts versus conventional slurries.Write Comment (0 comments) |
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Feb 04, 2005 at 08:00 PM |
 Product Briefing Outline: Sopra has launched the EP5
and EP12 tools which are based on Ellipsometric porosimetry (EP). This
is a unique technology to characterize CVD and spin coated porous ultra
low-k materials. EP measures the change of the optical properties and
thickness of the materials during adsorption and desorbtion of an
organic solvent.Write Comment (0 comments) |
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Feb 04, 2005 at 07:00 PM |
 Product Briefing Outline: Donaldson Company has launched the
"Filter Life Estimator," a new web-based tool that enables
semiconductor fabricators using ASML Lithography Tools to plan filter
maintenance schedules based on the contaminant mix in their particular
operation.
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Product Briefings 
