Product Briefing Outline: Toppan Photomasks has introduced a new DFM tool that will shorten cycle time and reduce risk in chip design through an exception dispositioning process for identifying and analyzing defects and design errors. The tool was developed in collaboration with Anchor Semiconductor, Inc. and is an extension of that company’s ‘NanoScope’ DFM platform. It allows designers and tapeout engineers to review “exceptions” found during the processing of customer data and masks. 

Product Briefing Outline: A unique Roller Pinion System (RPS) from Nexen Group, Inc., allows machine designers to incorporate highly accurate linear and rotary motion-control functions with zero backlash and speeds as high as 11 meters per second (36.1 feet per second).  The patented RPS technology can replace typical rack and pinions, linear motors, spur gears, chain/belt drives and ball-screws in critical motion-control applications that require high speed, great accuracy, and low maintenance and noise. 

Product Briefing Outline: A unique Roller Pinion System (RPS) from Nexen Group, Inc., allows machine designers to incorporate highly accurate linear and rotary motion-control functions with zero backlash and speeds as high as 11 meters per second (36.1 feet per second).  The patented RPS technology can replace typical rack and pinions, linear motors, spur gears, chain/belt drives and ball-screws in critical motion-control applications that require high speed, great accuracy, and low maintenance and noise. 

Product Briefing Outline: Carl Zeiss SMT has announced the completion of their final design - ‘PROVE’ - for the next generation Photomask Registration and Overlay Metrology system, which was developed in collaboration with SEMATECH. PROVE will allow for the production of more advanced photomasks with substantially improved image placement accuracy, according to the company.