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New Product: Rudolph reduces CoO for macro defect inspection with new AXi 940 module Print E-mail
May 15, 2008 at 01:23 PM

ImageProduct Briefing Outline: Rudolph Technologies has made available the AXi 940 macro defect inspection module. The new AXi 940 module will perform wafer frontside inspection as part of the all-surface ‘Explorer’ Inspection Cluster - a multi-surface inspection system designed to deliver fast, accurate and reliable macro inspection at a low cost-of-ownership. The first Explorer Inspection Cluster featuring an AXi 940 module is currently at a beta customer, and a second unit is scheduled to ship in April 2008. The initial systems are targeted primarily for high-volume production applications in advanced lithography and CMP processes. 

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New Product: GF Piping Systems’ Type 567 Butterfly Valve improves wear for multiple applications Print E-mail
May 14, 2008 at 06:01 PM

ImageProduct Briefing Outline: GF Piping Systems has introduced the new Type 567 Butterfly Valve in large diameter sizes up to 12 inches.  The new corrosion-resistant valve incorporates a double eccentric operating principle that provides improved wear and easier operation over traditional eccentric style butterfly valves.  Typical applications include industrial water treatment and waste water systems. 

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New Product: GF Piping Systems’ Type 567 Butterfly Valve improves wear for multiple applications Print E-mail
May 14, 2008 at 06:01 PM

ImageProduct Briefing Outline: GF Piping Systems has introduced the new Type 567 Butterfly Valve in large diameter sizes up to 12 inches.  The new corrosion-resistant valve incorporates a double eccentric operating principle that provides improved wear and easier operation over traditional eccentric style butterfly valves.  Typical applications include industrial water treatment and waste water systems. 

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New Product: Levitronix’s ‘BPS 600’ maglev pumps eliminate CMP slurry particle agglomeration Print E-mail
May 14, 2008 at 12:58 PM

ImageProduct Briefing Outline: Levitronix has introduced the new ‘BPS 600’ magnetically levitated pump technology, designed for demanding applications in the semiconductor industry such as CMP slurry delivery, copper electroplating and wafer cleaning at leading-edge process nodes. The patented impeller floats in a magnetic field only touching the fluid it is pumping, and can be fully integrated into a fully-closed loop electronic control system without the need of additional controller hardware. 

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New Product: Applied Materials’ Inflexion edge polishing system cleans in a single pass Print E-mail
May 14, 2008 at 11:58 AM

ImageProduct Briefing Outline: Applied Materials has introduced the ‘Applied Inflexion’ edge polishing system for high-precision defect removal that polishes and cleans the critical wafer edge region. The Applied Inflexion is claimed to be the only system that polishes the entire wafer edge, removing film stack residues and shallow surface defects in a single pass while minimizing the exclusion area in order to maximize the number of good die. In addition, the system precisely controls the edge profile, enabling process engineers to tailor the film-to-wafer interface to meet a wide range of integration requirements. 

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