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May 29, 2008 at 04:21 PM |
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Product Briefing Outline: Novellus Systems has launched two specific dry strip and clean systems that each target different photoresist removal requirements for leading-edge logic and memory manufacturing. The ‘G400’ is designed for large volume, high-throughput requirements of bulk and high-dose implant strip (HDIS) applications in DRAM and flash memory fabs. The ‘GxT’ is designed for HDIS, super-HDIS and BEOL clean applications, where low silicon loss and ultra-low defect levels are required in advanced logic applications. The ‘G400’ and ‘GxT’ are built upon Novellus’ high-throughput ‘GAMMA’ platform. Both systems have shipped to customers, with the first G400 going to a large Asian memory manufacturer and the GxT placed at multiple large foundries in Asia, according to Novellus. Write Comment (0 comments) |
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May 29, 2008 at 04:21 PM |
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Product Briefing Outline: Novellus Systems has launched two specific dry strip and clean systems that each target different photoresist removal requirements for leading-edge logic and memory manufacturing. The ‘G400’ is designed for large volume, high-throughput requirements of bulk and high-dose implant strip (HDIS) applications in DRAM and flash memory fabs. The ‘GxT’ is designed for HDIS, super-HDIS and BEOL clean applications, where low silicon loss and ultra-low defect levels are required in advanced logic applications. The ‘G400’ and ‘GxT’ are built upon Novellus’ high-throughput ‘GAMMA’ platform. Both systems have shipped to customers, with the first G400 going to a large Asian memory manufacturer and the GxT placed at multiple large foundries in Asia, according to Novellus. Write Comment (0 comments) |
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May 19, 2008 at 09:39 AM |
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Product Briefing Outline: ULVAC Technologies has launched its next generation Enviro ‘Optima’ Resist Strip System that the company claims has the smallest 300mm resist strip system footprint, with double the speed of the proven Enviro Optima platform. The ultra-fast robotics and remote plasma source with >10μm/min strip rate helps fabs achieve the lowest cost per wafer, with a throughput of 400wph, according to the company. Write Comment (0 comments) |
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May 19, 2008 at 09:39 AM |
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Product Briefing Outline: ULVAC Technologies has launched its next generation Enviro ‘Optima’ Resist Strip System that the company claims has the smallest 300mm resist strip system footprint, with double the speed of the proven Enviro Optima platform. The ultra-fast robotics and remote plasma source with >10μm/min strip rate helps fabs achieve the lowest cost per wafer, with a throughput of 400wph, according to the company. Write Comment (0 comments) |
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May 15, 2008 at 03:06 PM |
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Product Briefing Outline: Hach Ultra has introduced the MET ONE 6000 Series Remote Airborne Particle Counters, which offer accurate and reliable continuous particle monitoring. With a sensitivity range of 0.2 to 5.0µm at 0.1 cfm flow rate and 0.5 to 10µm at 1.0 cfm flow rate, the MET ONE 6000 series is designed to meet the specific needs of cleanroom operations within the semiconductor, hard disk drive and flat panel display industries. Write Comment (0 comments) |
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