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EHS News
New report stresses need for EHS risks assessment with nanotechnologies, backed by Intel Corp Print E-mail
Jul 19, 2006 at 12:32 PM
ImageA growing body of researchers and scientists are highlighting the need for more funding to carry out much needed research into the potential environmental, health and safety issues surrounding nano-materials and technologies. An influential U.S based body has released a new report urging the U.S Government to significantly increase funding into some of the known and more importantly yet un-known risks surrounding nanotech.Write Comment (0 comments)
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Point-of-use abatement for copper CMP Print E-mail
Jul 06, 2006 at 04:33 PM
MetronMetron Technology claims the semiconductor industry's first and "only" point-of-use (POU) solution for abating copper from a chemical mechanical planarization (CMP) system's effluent stream. Jointly developed by Applied Materials and BOC Edwards, the Aquareus system is exclusively sold and serviced worldwide by Metron Technology.Write Comment (0 comments)
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Tool Order: STMicroelectronics in multiple gas abatement system deal Print E-mail
Jun 29, 2006 at 04:44 PM
TecHarmonic STMicroelectronics has place a multiple systems order with TecHarmonic Inc for its new flagship Perfluorocompound (PFC) gas abatement system the Alpine-S. The systems are to be installed at STMicroelectronics fab in Singapore. Shipments have already started and will continue through the third quarter of 2006, according to the supplier.
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UMC first to gain RoHS compliance in all fabs Print E-mail
Jun 13, 2006 at 07:09 PM
UMC Fab12AUMC has announced that it has completed audits associated with QC 080000 IECQ Hazardous Substance Process Management (HSPM) qualification to become the first semiconductor manufacturer to achieve HSPM certification, according to the company.Write Comment (0 comments)
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Sharp to remove 90 percent of nitrogen from wastewater at Fukuyama fab Print E-mail
May 31, 2006 at 02:24 PM
Sharp Wastewater PlantSharp Corporation plans to start using new, non-diluting nitrogen carrying wastewater treatment plant at its Fukuyama, Hiroshima Prefecture fab in July 2006. The treatment plant is the first of its kind in the semiconductor industry, which the company claims will remove at least 90 percent of the nitrogen in wastewater without dilution processes.Write Comment (0 comments)
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WSC members to limit use of Perfluoroctane Sulfonate in photoresists Print E-mail
May 12, 2006 at 03:18 PM
PFOSThe World Semiconductor Council (WSC) has agreed on a new undertaking as part of the just concluded Tenth Anniversary meeting of the semiconductor trade associations of North Amercia, Japan, Taiwan, Korea and Europe to eliminate the non-critical use of process chemicals containing PFOS (Perfluoroctane Sulfonate).
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Mattson Technology gains "Star" status from Cal/OSHA Print E-mail
Apr 18, 2006 at 12:27 PM
MattsonMattson Technology, has attained "Star" status in the California Occupational Safety and Health Administration's (Cal/OSHA) California Voluntary Protection Program(Cal/VPP).Write Comment (0 comments)
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ST joins US EPA greenhouse gas reduction program Print E-mail
Mar 02, 2006 at 11:16 AM
STMicroelectronicsSTMicroelectronics announced a voluntary pledge to reduce its US greenhouse gas emissions by 50% per manufacturing unit from 2000 to 2010. The company has committed to the reduction goal as part of the US Environmental Protection Agency's (EPA's) Climate Leaders program, launched in February 2002.Write Comment (0 comments)
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Varian Semiconductor to install wind turbines at US HQ Print E-mail
Mar 01, 2006 at 03:46 PM
WindmillVarian Semiconductor Equipment Associates is seeking approval to install two wind turbines on its headquarters in Gloucester, Massachusetts. A wind turbine feasibility study undertaken last year highlighted that due to its proximity to coastal winds the turbines could provide Varian with up to 50% of its electricity requirements.Write Comment (0 comments)
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2006 Akira Inoue Award nominations deadline announced Print E-mail
Mar 01, 2006 at 02:17 PM
Akira Inoue AwardNominations for the 2006 Akira Inoue Award for outstanding achievement in environment, health and safety in the semiconductor industry are due by July 28, 2006, according to SEMI.
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