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Feb 08, 2007 at 05:43 PM |
 EV Group (EVG) has formed a product development partnership with GenISys GmbH for the development and marketing of a simulation platform for advanced mask aligner lithography processes, specifically for MEMS. The partners aim to improve MEMS development times, yields and overall costs throughout the manufacturing process.
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Jan 31, 2007 at 07:06 PM |
 Cymer executives noted during a conference call to discuss quarterly financial performance that the view of lithography experts attending Cymer's Annual Lithography Symposium, held in December, 2006 was that double patterning (DP) with Immersion tools was the preferred solution at the 32nm node. This consensus is due to EUV Lithography technology not being production ready for this node migration in 2009 and the slow development of viable high index liquids that could see the retention of single pass patterning.Write Comment (0 comments) |
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Jan 24, 2007 at 03:31 PM |
 The Semiconductor Technology Academic Research Center (STARC) of Japan has selected Blaze DFM's software targeting low-power reference flows for 65nm and below designs by STARC members.
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Jan 17, 2007 at 02:01 PM |
 ASML posted record revenues for 2006 as well as record sequential revenues for the last three quarters of 2006 as revealed in their full-year financial results, announced today. 2006 net sales came in at €3.597 billion, up 42 percent compared with €2.529 billion in 2005. Q4 2006 net sales reached €1.068 billion, up 11 percent compared with Q3 2006 net sales of €958 million. In Q4 2006, ASML shipped 72 lithography systems (70 percent ArF: per value), including 64 new and 8 refurbished.
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Jan 17, 2007 at 12:01 PM |
 ASML has announced that it has received 2 more confirmed orders from individual companies for pre-production EUV lithography tools. Deliveries are expected to begin in 2009, according to Eric Meurice, president and CEO of ASML during a press conference to discuss fourth quarter and year-end financial results.
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Jan 11, 2007 at 05:15 PM |
 According to Molecular Imprints, a leading semiconductor memory manufacturer has purchased its ‘Step and Flash Imprint Lithography' tool - an ‘Imprio 250' - for process development and device prototyping at 32nm node and below. The tool has already been shipped and is currently being installed, the company said.
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Dec 19, 2006 at 01:59 PM |
 ASML Holding has agreed to acquire Brion Technologies, a provider of semiconductor design and wafer manufacturing optimization solutions for advanced lithography. The companies expect that the transaction will cost ASML $270 million cash. ASML also expects Brion to be cash positive in 2007.
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Dec 14, 2006 at 12:50 PM |
 Powerchip Semiconductor Corporation (PSC) has continued its long-standing supplier relationship with Nikon Precision with the memory manufacturer selecting Nikon's NSR-S610C ArF immersion scanner for its 50nm NAND Flash process at its 300mm fab 12M, located in Hsinchu, Taiwan and dedicated to NAND Flash production. This is one of the first production immersion tool orders for the NSR-610C, which uses catadioptric optics of NA 1.3. Shipment schedules were not disclosed.
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Dec 08, 2006 at 05:52 PM |
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 Dow Corning Corp. and Tokyo Ohka Kogyo Co., Ltd. (TOK) have jointly developed a bilayer photoresist that uses a silicon polymer, previously not possible due to outgassing issues in the imaging layer, eliminating the need for other resist layers such as a hard mask for etch protection.
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Dec 07, 2006 at 10:52 AM |
 Tokyo Electron Limited (TEL) and ASML Holding NV plan to work more closely together in what the companies describe as a ‘long-term joint development program' that is designed to optimize both the lithography and track tools for improved performance for R&D and high-volume production for 45nm and future technology node processes.
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| Results 99 - 112 of 233 |
Lithography 
